Hi,I hope i get the solution here. Previously i was validated a method for Silicon in parental by PerkinElmer NexION 300X instrument. During the development and validation i was never faced any issue related to Silicon. Now i am adopting the same method to another product.Now I am getting Silicon in blank that is almost 10 times more intensity than previous intensity. So how can i eliminate the blank silicon intensity and what could be the reason for this issue.Here i am using same chemicals, standards and ICP grade water as previous used.Precisely i got Silicon in blank about 450 counts. Now i am getting 6000 counts.